HISTORY
- 1962
- Started business as Sugimoto Kogyosho.
- 1966
- Established as the juridical corporation, Nikka Seiko Co., Ltd.
- 1970
- Started sales of ADFIX series for slicing / cutting process.
- 1976
- Started sales of SKYCOAT(current PLAINCOAT). series for surface protection in process.
- 1977
- Started sales of Epoxy Adhesives, Z-BOND series for slicing process.
- 1979
- Started sales of GASCOLUMN(Deoxydration column) and
DRYCOLUMN(Dehydration column).
- 1985
- Opened Utsunomiya Plant in Tochigi.
- 1986
- Developed SKYLIQUID series for material wafer auto-mounting before polishing process.
- 1987
- Launched direct trade with overseas customers. Started business with distributors in Korea and Taiwan.
- 1989
- Applied patent for the alkali soluble liquid wax, SKYLIQUID Series.
(Obtained the patent, Later)
- 1993
- Transferred Head office.
- 1996
- Opened R & D center in Tokyo.
- 2000
-
Developed SPACELIQUID series for semiconductor device wafer thinning
- 2001
- Obtained ISO9001 certification at all sites.
- 2003
- Obtained ISO14001 certification at Utsunomiya plant.
- 2004
- Developed DRYNON-C for wafer surface treatment.
- 2007
- Established a joint stock subsidiary in Shanghai, China with co-companies. It acts as our Primary agent in China.
- 2009
- Transferred Head office to Nozawa, Setagaya-ku, in Tokyo.
- 2012
- Newly established a wholly owned subsidiary in Shanghai and take over
the representative office in China.
- 2014
- Selected as the GLOBAL NICHE TOP COMPANIES SELECTION 100.