HISTORY
- 1962
- Started business as Sugimoto Kogyosho by manufacturing and selling molded molecular sieves.
- 1966
- Incorporated as NIKKA SEIKO CO., LTD.
- 1970
- Started Wax business by manufacturing and selling ADFIX for slicing process of semiconductor industry.
- 1976
- Started sales of SKYCOAT(current PLAINCOAT) as surface protection for precision process.
- 1977
- Started sales of epoxy adhesives, Z-BOND, for slicing process. Research and Development of epoxy adhesives have started.
- 1979
- Started sales of GASCOLUMN(Deoxydration column) and
DRYCOLUMN(Dehydration column).
- 1985
- Opened Utsunomiya Plant in Tochigi.
- 1986
- Developed SKYLIQUID series which enable wafer auto-mounting for semiconductor polishing process.
- 1987
- Launched direct trade with overseas customers. Started business with distributors in South Korea and Taiwan.
- 1989
- Applied patent for the alkali soluble liquid wax, SKYLIQUID Series.
(Obtained the patent, Later)
- 1993
- Transferred Head office.
- 1996
- Opened R & D center in Tokyo.
- 2000
- Developed SPACELIQUID series for semiconductor device wafer thinning
- 2001
- Obtained ISO9001 certification at all sites.
- 2003
- Obtained ISO14001 certification at Utsunomiya plant.
- 2004
- Developed DRYNON-C for wafer surface treatment.
- 2007
- Established a joint stock subsidiary in Shanghai, China with cooperating companies as our primary agent in China.
- 2009
- Transferred Head office to Nozawa, Setagaya-ku, in Tokyo.
- 2012
- Established a wholly owned subsidiary in Shanghai which took over the primary agent business in China.
- 2014
- Awarded as the GLOBAL NICHE TOP COMPANIES SELECTION 100 by METI.
- 2015
- Celebrated the 50th anniversary.
- 2017
- Published our company history “50 Years of NIKKA SEIKO”.
- 2023
- 1st building “Manufacturing plant” was completed in Tochigi plant and R & D Center moved in.