THINNING PROCESS OF PATTERNED WAFER
Achieves backside thinning of various patterned wafers.
SPACELIQUID has high temperature resitivity, high chemical resistivity and low outgassing properties. Enables backside processes consistently from backside grinding/ thinning to high temperature photolithography processes without removing from carrier plates.
SPACELIQUID Series
SPACELIQUID is newly developed with high softening point and chemical resistant characterictics for mounting patterned wafers of back grindings and other processes. Wax layer thickness is about 5-10 times of SKYLIQUID so that protects patterned surface. Easy dewax by solvents.
ASTROLIQUID Series
ASTROLIQUID is developed for backside grinding of patterned semiconductor device wafers. The thickness of coating film can be adjusted by selecting the wax concentration. It has excellent coatability, adhesion, and workability on patterned surfaces. After processing, dewaxing is easy with a solvent such as IPA.
PLAINCOAT Series
Good for protecting from scratches or vacuum marks in wax-less polishing process of semiconductor wafers. It will help to make high accuracy wafers by improving flatness. For optical glass, our coating agent can protect lenses from burns, etching, scratches and chipping as well as polishing slurry and abrasives. Various types are available for the needs of users such as removing or chemical resitant.
NIKKASOLE
Cleaning various waxes such as SKYWAX, ALCOWAX and SHIFTWAX. Good for rough cleaning of oil type Coolant. Friendly working condition can be maintained due to high flash point of 73℃ and less odor. LC type is good for pitch type wax.
SHIFTWAX Series
Good for high precision processes of cutting, grinding, lapping, polishing, etc. Cleaning can be done by alkaline detergents, alcohols such as isopropyl alcohol as well as acetone or hydrocarbon solvents.
ALCOWAX Series
Good for a variety of processes, the same as SHIFTWAX. Less attacked by water soluble alkaline coolants as it could not be dissolved by alkaline agents well. Cleaning can be done by alcohols such as Isopropyl alcohol, acetone, or hydrocarbon solvents.
SKY WAX Series
Has been used for a long time in grinding, lapping and polishing processes. Wide variety types are available from high to low Softening point and Viscosity. Good for high precision process. Can not be dissolved by alkaline agents or alcohols well, but Hydrocarbon solvents can clean SKYWAX well.
PROTECTLIQUID Series
This is liquid type of PROTECTWAX. Since it has strong chemical resistant ability, it works as a masking agent. Good for surface protection during etching or plating process.
KILALACLEAN
KILALACLEAN 101 is high pure cleaning agent. Especially good for wax removal on semiconductor wafers due to low level of dusts and metals. 301 is low-etching type.
DEVEL
Strong cleaning power is suitable for removing our ADFIX and SHIFTWAX as well as greases and contaminations on polishing plate. Less foaming type, DEVEL A, is also available.
RUNGEL F
Less metal-etching cleaner. Due to the antirust effet, good for wax cleaning in magnetic material process.
CLAIR C
Removes not only wax but particles without damage on workpiece of glass or compound semiconductor.
PLACLEAN HNC
Removes abrasives and particles stuck by static electricity. Applicable for strong grease removal. Has excellent biodegradability as it is phosphorus-free.
NORMAL A
By it's strong surfactant effect, good for removing greases, abrasives and waxes well.
EMUNIKKA
Removes oil by strong emulsifying effect. EMUNIKKA #2 is weak alkali type and used at room temperature. EMUNIKKA #55 is strong alkali type and used by heating. #55 is good for cleaning our ADFIX as well.
FERRITOL
Eliminates metal ions in lapping process of quartz, ceramics and glass.
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