LAPPING and POLISHING
Achieves highly flat temporary fixing and high-purity cleaning.
We offer the best one from a variety of our products such as solid wax, liquid wax with suitable coating or resistance properties for various materials, wafers, patterned wafers and processes.
SKYLIQUID Series
SKYLIQUID series, coated in automatic mounter or by spinner, can attain super flat mounting which makes high precision wafers. Can be cleaned by SC-1 or our high pure cleaning agent, KILALACLEAN, which reduces particles and haze and makes ultra clean wafers.
AQUALIQUID Series
WA series is water-soluble liquid wax which is liquefied by organic solvent. Can be mounted at lower temperature. JC series is environmental-friendly wax as the solvent is water. It can be coated on a polishing plate. Dewaxed by alkali detergents such as our high-purity "KILALA CLEAN".
DRYNON C
New type water soluble dry preventive agent. Prevents polished surface from dryness and improves stain problem. Reduces natural oxide layer and prevent from re-adhering of particles.
KILALACLEAN
KILALACLEAN 101 is high pure cleaning agent. Especially good for wax removal on semiconductor wafers due to low level of dusts and metals. 301 is low-etching type.
PLAINCOAT Series
Good for protecting from scratches or vacuum marks in wax-less polishing process of semiconductor wafers. It will help to make high accuracy wafers by improving flatness. For optical glass, our coating agent can protect lenses from burns, etching, scratches and chipping as well as polishing slurry and abrasives. Various types are available for the needs of users such as removing or chemical resitant.
SHIFTWAX Series
Good for high precision processes of cutting, grinding, lapping, polishing, etc. Cleaning can be done by alkaline detergents, alcohols such as isopropyl alcohol as well as acetone or hydrocarbon solvents.
ALCOWAX Series
Good for a variety of processes, the same as SHIFTWAX. Less attacked by water soluble alkaline coolants as it could not be dissolved by alkaline agents well. Cleaning can be done by alcohols such as Isopropyl alcohol, acetone, or hydrocarbon solvents.
AQUAWAX Series
One type is cleaned by hot water, the other is cleaned by water at room temperature. Cleaning process is easier and simpler so that could improve working conditions and waste treatement could be easier.
SKY WAX Series
Has been used for a long time in grinding, lapping and polishing processes. Wide variety types are available from high to low Softening point and Viscosity. Good for high precision process. Can not be dissolved by alkaline agents or alcohols well, but Hydrocarbon solvents can clean SKYWAX well.
NS-COOLANT Series
Lubricant NS-COOLANT Y and SL-1 are good for diamond slurry. NS-COOLANT AD-NA and CS-5 are weak alkalescent types without dissolving our ADFIX and SHIFTWAX used in OD blade cutting process.
EMUNIKKA
Removes oil by strong emulsifying effect. EMUNIKKA #2 is weak alkali type and used at room temperature. EMUNIKKA #55 is strong alkali type and used by heating. #55 is good for cleaning our ADFIX as well.
RUNGEL F
Less metal-etching cleaner. Due to the antirust effet, good for wax cleaning in magnetic material process.
NIKKASOLE
Cleaning various waxes such as SKYWAX, ALCOWAX and SHIFTWAX. Good for rough cleaning of oil type Coolant. Friendly working condition can be maintained due to high flash point of 73℃ and less odor. LC type is good for pitch type wax.
CLAIR C
Removes not only wax but particles without damage on workpiece of glass or compound semiconductor.
NORMAL A
By it's strong surfactant effect, good for removing greases, abrasives and waxes well.
FERRITOL
Eliminates metal ions in lapping process of quartz, ceramics and glass.
PLACLEAN HNC
Removes abrasives and particles stuck by static electricity. Applicable for strong grease removal. Has excellent biodegradability as it is phosphorus-free.
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